Effect of Wetting Time on CD Uniformity in Immersion Lithography
Process Setup and Optimization • LithExx-Systems
Photomask
Extending ArFi to 22 nm and Beyond with Advanced CDU Control
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment | Semantic Scholar
Intel and Nikon Litho Specialists Discuss Overlay Matching and Edge Placement Error for Production Beyond 20 nm
CD uniformity control for thick resist process
Local y CD uniformity of 480 nm features-1.0 mm array (left); local... | Download Scientific Diagram
Sub-20 nm multilayer nanopillar patterning for hybrid SET/CMOS integration - ScienceDirect
Measured CD Uniformity for Conventional Method and New Method.... | Download Scientific Diagram
Comprehensive CD Uniformity Control in Lithography and Etch Process - ppt download
Intrawafer CD uniformity trend for Etch GATE in 40nm > 30% CD... | Download Scientific Diagram
CD uniformity at pitch 80nm after a/litho and b/etch for negative tone... | Download Scientific Diagram
Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modelin
CD uniformity over the image field (range) versus focus for 0.25 µm... | Download Scientific Diagram
Critical Dimension Control and its Implications in IC Performance - ppt download
Requirement for mask CD uniformity and mask induced overlay error. | Download Scientific Diagram
Extreme ultraviolet lithography reticle local CD uniformity correlation to wafer local CD uniformity
a) Across wafer CD uniformity for 110 nm wide (nominal) feature after... | Download Scientific Diagram
슬라이드 1
CD uniformity maps obtained using the optical technique described... | Download Scientific Diagram
In-field CD uniformity (CDU) of 32nm HP L/S pattern. | Download Scientific Diagram
Controlling Uniformity At The Edge
Enhanced Spatial PEB Uniformity through a Novel Bake Plate Design | Semantic Scholar
The Global Variation of Photoresist Topography and CD Uniformity due to Local High Step
